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The Applications of Silicon Nitride

wallpapers Industry 2020-10-10
Silicon nitride is used as a high-grade refractory material. For example, SI3N4-SIC refractory is used in blast furnace body and other parts in cooperation with sic; when it is used in combination with BN as SI3N4-BN material, it is used in horizontal continuous casting separation ring. SI3N4-BN series flat continuous casting separation ring is a fine-structure ceramic material with a uniform structure and high mechanical strength. It has good thermal shock resistance and will not be wetted by molten steel, which meets the process requirements of continuous casting.

Silicon nitride ceramic materials have excellent properties such as high thermal stability, strong oxidation resistance and high product dimensional accuracy. Since silicon nitride is a covalent compound with the high bond strength and can form an oxide protective film in the air, it also has good chemical stability. It will not be oxidized below 1200°C. The formation of a protective film at 1200~1600°C can prevent further. It is rusted, and is not infiltrated or corroded by many molten metals or alloys such as aluminium, lead, tin, silver, brass, nickel, etc., but can be corrupted by molten magnesium, nickel-chromium alloy, stainless steel, etc.
Silicon nitride ceramic materials can be used for high-temperature engineering components, advanced refractories in the metallurgical industry, corrosion-resistant parts and sealing components in the chemical industry, tools and cutting tools in the machining industry, etc.
Since silicon nitride can form a strong bond with silicon carbide, aluminium oxide, thorium dioxide, boron nitride, etc., it can be used as a bonding material to be modified in different proportions.
Besides, silicon nitride can also be applied to solar cells. After the silicon nitride film is plated by the PECVD method, it can not only be used as an anti-reflection film to reduce the reflection of the incident light but also, during the deposition of the silicon nitride film, the hydrogen atoms of the reaction product enter the silicon nitride film and the silicon wafer, Played a role in passivating defects. The ratio of silicon nitride to silicon atom number here is not strictly 4:3 but fluctuates within a specific range according to different process conditions. The physical properties of the film corresponding to different atomic ratios are other.

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Tag: Silicon Nitride